As scaling of device dimensions has continued, it has become necessary to replace traditional SiO2 with high dielectric constant materials in the conventional CMOS devices. In addition, use of metal gate electrodes and Germanium substrates may have to be used in order to address leakage and mobility issues. Al2O3 is one of the potential candidates both for CMOS and as a blocking dielectric for Flash memory applications owing to its low leakage. In this study, the effects of sputtering conditions and post-deposition annealing conditions on the electrical and reliability characteristics of MOS capacitors using Al2O3 films on Si and Ge substrates with Aluminium gate electrodes have been presented. It was observed that higher sputtering power resulted in larger flat-band voltage (Vfb) shifts, more hysteresis, higher interface state density (Dit) and a poorer reliability. Wit was also found that while a short duration high temperature annealing improves film characteristics, a long duration anneal even at 800C was found to be detrimental to MOS characteristics. Finally, the electronic conduction mechanism in Al2O3 films was also studied. It was observed that the conduction mechanism varied depending on the annealing condition, thickness of film and electric field. © 2017 Author(s).
cited By ; Conference of International Conference on Functional Materials, Characterization, Solid State Physics, Power, Thermal and Combustion Energy 2017, FCSPTC 2017 ; Conference Date: 7 April 2017 Through 8 April 2017; Conference Code:129216
S. Gopalan, Dutta, S., Ramesh, S., Prathapan, R., and Sreehari, G., “Al203 thin films on Silicon and Germanium substrates for CMOS and flash memory applications”, in AIP Conference Proceedings, 2017, vol. 1859.