Coulometry and Auger Electron Spectroscopy (AES) were employed to study thickness and composition of anodic films formed on nickel under high rate transpassive dissolution conditions. Nickel anodes were polarized at constant current densities up to 30 A/cm2 in alkaline nitrate electrolytes of different nitrate and hydroxyl ion concentration using a flow channel cell with a constant electrolyte flow velocity of 10m/sec. Results show that with increasing current density film thickness goes through a maximum. Nitrogen is detected at the apparent film metal interface in the current region where metal dissolution occurs. No correlation between anodic film thickness and dissolution efficiency is found. The data, together with previous observations, suggest that high rate transpassive dissolution takes place from film free sites.
Dr. Madhav Datta, Mathieu, H. J., and Landolt, D., “Anodic film studies on nickel under high rate transpassive dissolution conditions”, Electrochimica Acta, vol. 24, pp. 843–850, 1979.