Publication Type:

Conference Paper

Source:

Electron Devices Meeting, 2000. IEDM'00. Technical Digest. International, IEEE (2000)

Cite this Research Publication

B. Hun Lee, Choi, R., Kang, L., Dr. Sundararaman Gopalan, Nieh, R., Onishi, K., Jeon, Y., Qi, W. - J., Kang, C., and Lee, J. C., “Characteristics of TaN gate MOSFET with ultrathin hafnium oxide (8/spl Aring/-12/spl Aring/)”, in Electron Devices Meeting, 2000. IEDM'00. Technical Digest. International, 2000.

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