Publication Type:

Conference Paper

Source:

ECS (2003)

URL:

https://lirias.kuleuven.be/handle/123456789/65198

Cite this Research Publication

C. D. Young, Kerber, A., Hou, T. H., Cartier, E., Brown, G. A., Bersuker, G., Kim, Y., Lim, C., Gutt, J., Lysaght, P., Dr. Sundararaman Gopalan, and , “Charge trapping and mobility degradation in MOCVD hafnium silicate gate dielectric stack structures”, 2003.

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