Publication Type:

Journal Article

Source:

Optik, Elsevier GmbH (2015)

URL:

http://www.scopus.com/record/display.url?eid=2-s2.0-84940957128&origin=resultslist&sort=plf-f&src=s&st1=Deposition+and+characterization+of+alpha+alumina+thin+films+prepared+by+chemical+bath+deposition&st2=&sid=BC914077A50261BC0C8235042A14D04D.FZg2ODcJC9Ar

Keywords:

Alpha alumina, Alumina, Chemical bath deposition technique, Chemical-bath deposition, Crystallinities, Deposition, Energy gap, Glass substrates, Optical films, Oxygen vacancies, Photoluminescence spectroscopy, Photoluminescence spectrum, scanning electron microscopy, Substrates, Thin films, Ultraviolet visible spectroscopy, UV visible spectroscopy, X ray diffraction, XRD

Abstract:

Alpha alumina thin film has been deposited on glass substrate by simple chemical bath deposition technique at 60. °C. The structure and the crystallinity of the alpha alumina thin film were determined by X-ray diffraction and the grain size calculated from X-ray diffraction was 85. nm. The optical band gap of the film measured from UV-visible spectroscopy was 4.5. eV. The surface morphology of the film was traced by scanning electron microscopy and photoluminescence spectrum of the film shows that the presence of oxygen vacancies. © 2015 Elsevier GmbH.

Notes:

cited By 0; Article in Press

Cite this Research Publication

Pa Kathirvel, Chandrasekaran, Jb, Manoharan, Db, and Kumar, Sc, “Deposition and characterization of alpha alumina thin films prepared by chemical bath deposition”, Optik, 2015.