Publication Type:

Journal Article

Source:

Applied Nanoscience, Springer, Volume 2, Number 1, p.1–6 (2012)

Cite this Research Publication

S. Dutta, Ramesh, S., Shankar, B., and Dr. Sundararaman Gopalan, “Effect of PVD process parameters on the quality and reliability of thin (10–30 nm) Al2O3 dielectrics”, Applied Nanoscience, vol. 2, pp. 1–6, 2012.

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