Publication Type:

Conference Paper

Source:

VLSI Technology, 2002. Digest of Technical Papers. 2002 Symposium on, IEEE (2002)

Cite this Research Publication

K. Onishi, Kang, C. Seok, Choi, R., Cho, H. - J., Dr. Sundararaman Gopalan, Nieh, R., Krishnan, S., and Lee, J. C., “Effects of high-temperature forming gas anneal on HfO/sub 2/MOSFET performance”, in VLSI Technology, 2002. Digest of Technical Papers. 2002 Symposium on, 2002.

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