Publication Type:

Conference Paper

Source:

Electron Devices Meeting, 2002. IEDM'02. International, IEEE (2002)

Cite this Research Publication

R. Choi, Onishi, K., Kang, C. Seok, Dr. Sundararaman Gopalan, Nieh, R., Kim, Y. H., Han, J. H., Krishnan, S., Cho, H. - J., Shahriar, A., and , “Fabrication of high quality ultra-thin HfO/sub 2/gate dielectric MOSFETs using deuterium anneal”, in Electron Devices Meeting, 2002. IEDM'02. International, 2002.

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