Publication Type:

Conference Proceedings

Source:

Atomic Layer Deposition Conference, American Vacuum Society, p.1308-1311 (2004)

Cite this Research Publication

Kim G. Y., Srivastava A., D., F., A., L., Z., K., Seidel T. E., and Dr. Sasangan Ramanathan, “A High Deposition Rate Process Using Limited Optimized Reaction ALD”, Atomic Layer Deposition Conference”, Atomic Layer Deposition Conference, American Vacuum Society. pp. 1308-1311, 2004.

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