Publication Type:

Journal Article

Source:

Applied physics letters, American Institute of Physics, Volume 82, Number 11, p.1757–1759 (2003)

Cite this Research Publication

M. Shahariar Akbar, Dr. Sundararaman Gopalan, Cho, H. - J., Onishi, K., Choi, R., Nieh, R., Kang, C. S., Kim, Y. H., Han, J., Krishnan, S., and , “High-performance TaN/HfSiON/Si metal-oxide-semiconductor structures prepared by NH3 post-deposition anneal”, Applied physics letters, vol. 82, pp. 1757–1759, 2003.

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