Publication Type:

Conference Proceedings

Source:

Techincal Digest, International Electron Devices Meeting, p.221-224 (2002)

Cite this Research Publication

J. H. Lee, J., K., S., K. Y., S., J. H., Lee, N. I., Kang, H. K., Suh, K. P., Jeong, M. M., Hyun, K., Baik, H. S., Chung, Y. S., Liu, X., Dr. Sasangan Ramanathan, Seidel, T. E., Winkler, J., Londergan, A., Kim, H. Y., M., J., and Lee, N. K., “Mass Production Worthy HfO2-Al2O3 Laminates Capacitor Technology using Hf Liquid Precursor for sub-100 nm DRAMS”, Techincal Digest, International Electron Devices Meeting. pp. 221-224, 2002.

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