Publication Type : Conference Proceedings
Publisher : Techincal Digest, International Electron Devices Meeting
Source : Techincal Digest, International Electron Devices Meeting. pp. 221-224, 2002.
Campus : Coimbatore
School : School of Engineering
Department : Chemical
Year : 2002
Abstract :
Cite this Research Publication : J. H Lee, Kim J., Kim Y. S., S., J. H., Lee, N. I., Kang, H. K., Suh, K. P., Jeong, M. M., Hyun, K., Baik, H. S., Chung, Y. S., Liu, X., Dr. Sasangan Ramanathan, Seidel, T. E., Winkler, J., Londergan, A., Kim, H. Y., M., J., and Lee, N. K., “Mass Production Worthy HfO2-Al2O3 Laminates Capacitor Technology using Hf Liquid Precursor for sub-100 nm DRAMS”, Techincal Digest, International Electron Devices Meeting. pp. 221-224, 2002.