Publication Type:

Miscellaneous

Source:

(2006)

URL:

https://www.google.si/patents/US7077728

Abstract:

According to one exemplary embodiment, a method of fabricating an array on a substrate includes forming a layer of a first material adjacent to and over a plurality of segments of a second material on the substrate. The method further includes performing a first CMP process step to form a plurality of segments of the first material, where the plurality of segments of the first material alternate with the plurality of segments of the second material. According to this exemplary embodiment, the method further includes performing a second CMP process step to achieve a target thickness of the plurality of segments of the first material. The first CMP process step comprises a first slurry having particles of a first particle size and the second CMP process step comprises a second slurry having particles of a second particle size, where the second particle size is smaller than the first particle size.

Cite this Research Publication

K. Achuthan and Sahota, K., “Method for reducing edge array erosion in a high-density array”. 2006.

207
PROGRAMS
OFFERED
6
AMRITA
CAMPUSES
15
CONSTITUENT
SCHOOLS
A
GRADE BY
NAAC, MHRD
8th
RANK(INDIA):
NIRF 2018
150+
INTERNATIONAL
PARTNERS
  • Amrita on Social Media

  • Contact us

    Amrita Vishwa Vidyapeetham,
    Amritanagar,
    Coimbatore - 641 112,
    Tamil Nadu, India.
    • Fax                 : +91 (422) 268 6274
    • Coimbatore   : +91 (422) 268 5000
    • Amritapuri    : +91 (476) 280 1280
    • Bengaluru     : +91 (080) 251 83700
    • Kochi              : +91 (484) 280 1234
    • Mysuru          : +91 (821) 234 3479
    • Chennai         : +91 (44 ) 276 02165
    • Contact Details »