Publication Type:

Conference Proceedings

Source:

Proceedings of SPIE, Micromachining and Microfabrication, International Society for Optics and Photonics, Volume 3223, p.178 (1997)

URL:

http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=932696

Abstract:

Patterning of thin films or foils by wet etching generally involves selective material removal through photoresist masks. Compared to the commonly employed chemical etching process, the electrochemical method of metal removal offers better control and flexibility for microfabrication. Other advantages include higher machining rate, the use of non-toxic and non- corrosive electrolyte and the possibility of machining a wide range of electrically conducting materials. Electrochemical metal removal (electrochemical micromachining) is now receiving attention in the electronics and other high-tech industries as a greener processing technology for microfabrication. Several examples of the application of electrochemical micromachining are presented in this paper. These examples demonstrate the challenges and opportunities offered by electrochemical metal removal in microfabrication.

Cite this Research Publication

Dr. Madhav Datta, “Microfabrication by through-mask electrochemical micromachining”, Proceedings of SPIE, Micromachining and Microfabrication, vol. 3223. International Society for Optics and Photonics, p. 178, 1997.

207
PROGRAMS
OFFERED
5
AMRITA
CAMPUSES
15
CONSTITUENT
SCHOOLS
A
GRADE BY
NAAC, MHRD
9th
RANK(INDIA):
NIRF 2017
150+
INTERNATIONAL
PARTNERS