Publication Type:

Journal Article

Source:

Rapid Thermal and Other Short-Time Technologies III, ECS, Pennington, p.163 - 176 (2002)

Cite this Research Publication

A. R. Londergan, Dr. Sasangan Ramanathan, Vu, K., Rassiga, S., Hiznay, R., Winkler, J., Velasco, H., Matthysse, L., Seidel, T. E., Ang, C. H., and , “Process Optimization in Atomic Layer Deposition of High-K Oxides for Advanced gate Stack Engineering”, Rapid Thermal and Other Short-Time Technologies III, ECS, Pennington, pp. 163 - 176, 2002.

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