Publication Type:

Conference Paper

Source:

SYMPOSIUM ON VLSI TECHNOLOGY (2000)

URL:

http://gistexel.com/wp-content/uploads/2014/09/2000_Sym.VLSI_.Tech_L.Kang_.pdf

Abstract:

MOSCAPs and MOSFETs of a single-layer thin HfO2 gate dielectric with n+ polysilicon gate were fabricated and characterized. Polysilicon process was optimized such that leakage current and equivalent oxide thickness of HfOz remained low. Excellent C-V properties (e.g. low Dit and frequency dispersion) and reliability characteristics were obtained. Reasonable MOSFET quality was also demonstrated.

Cite this Research Publication

L. Kang, Jeon, Y., Onishi, K., Lee, B. Hun, Qi, W. - J., Nieh, R., Dr. Sundararaman Gopalan, and Lee, J. C., “Single-Layer Thin HfO\~ 2 Gate Dielectric with n+-Polysilicon Gate”, in SYMPOSIUM ON VLSI TECHNOLOGY, 2000.

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