Publication Type:

Journal Article

Source:

Electrochemical and Solid-State Letters, The Electrochemical Society, Volume 3, Number 8, p.389–391 (2000)

Cite this Research Publication

A. Lucas, Dr. Sundararaman Gopalan, Lee, J. C., Kaushal, S., Niino, R., and Tada, Y., “Ultrathin Gate Oxynitrides Grown Using Fast Ramp Vertical Furnace for Sub-130 Nanometer Technology”, Electrochemical and Solid-State Letters, vol. 3, pp. 389–391, 2000.

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