Publication Type:

Conference Paper

Source:

32nd IEEE Semiconductor Interface Specialist Conference, Washington DC (2001)

Cite this Research Publication

Dr. Sundararaman Gopalan, Dharmarajan, E., Nieh, R., Onishi, K., Kang, C. S., Choi, R., Cho, H., and Lee, J. C., “Ultrathin Hafnium Silicate Films with TaN and Polysilicon Gate Electrodes for Gate Dielectric Application”, in 32nd IEEE Semiconductor Interface Specialist Conference, Washington DC, 2001.

207
PROGRAMS
OFFERED
5
AMRITA
CAMPUSES
15
CONSTITUENT
SCHOOLS
A
GRADE BY
NAAC, MHRD
8th
RANK(INDIA):
NIRF 2018
150+
INTERNATIONAL
PARTNERS