Publication Type:

Conference Paper

Source:

32nd IEEE Semiconductor Interface Specialist Conference, Washington DC (2001)

Cite this Research Publication

Dr. Sundararaman Gopalan, Dharmarajan, E., Nieh, R., Onishi, K., Kang, C. S., Choi, R., Cho, H., and Lee, J. C., “Ultrathin Hafnium Silicate Films with TaN and Polysilicon Gate Electrodes for Gate Dielectric Application”, in 32nd IEEE Semiconductor Interface Specialist Conference, Washington DC, 2001.