Publication Type:

Journal Article

Source:

Advanced Metallization and Interconnect Systems for ULSI Applications in 1997, p.635–640 (1997)

Cite this Research Publication

K. Achuthan, Hetherington, D. L., and Babu, S. V., “Wear rate characterization of CMP pads using laser scanning confocal microscopy”, Advanced Metallization and Interconnect Systems for ULSI Applications in 1997, pp. 635–640, 1997.

207
PROGRAMS
OFFERED
5
AMRITA
CAMPUSES
15
CONSTITUENT
SCHOOLS
A
GRADE BY
NAAC, MHRD
9th
RANK(INDIA):
NIRF 2017
150+
INTERNATIONAL
PARTNERS