Date:
Saturday, October 1, 2016 to Saturday, December 31, 2016
Department:
Electrical and Electronics Engineering
School:
School of Engineering
Funding Agency:
Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP)
The Project entitled "Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching" is funded by Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP).
Duration: 2016
Host Institute: CeNSE, Indian Institute of Science Bangalore, India
Status: Completed
