Back close

Linearity Improvement in E-mode Ferroelectric GaN MOS-HEMT using Dual Gate Technology

Publication Type : Journal Article

Source : Micro & Nano Letters

Url :

Campus : Amaravati

School : School of Engineering

Year : 2019

Abstract : In this work, an enhancement mode dual gate ferroelectric gallium nitride metal oxide semiconductor-high electron mobility transistor (GaN MOS-HEMT) is proposed with enhanced linearity characteristics. The different DC characteristics of the device are analysed and compared with available experimental data of single gate un-recessed ferroelectric GaN MOS-HEMT. In order to analyse the linearity performance of the devices, a look up table-based large signal model is developed directly from technology computer-aided device simulation results built by feeding different small signal parameters. The different linearity characteristics such as input third-order intercept point (IIP3), the input gain compression point (P1dB), third-order intermodulation (IM3) and the carrier to intermodulation power ratio of both the devices are compared by harmonic balance simulation of the developed large signal models. The interlink between IIP3 and IM3 with transconductance indicates that the broader the transconductance distribution with respect to different gate voltage generates higher IIP3 and lower IM3, which results in an improved linearity performance. The dual gate device shows improved linearity performance resulting in applicability in radiofrequency front end receiver.

Cite this Research Publication : Panda, Deepak Kumar, and Trupti Ranjan Lenka. "Linearity improvement in E-mode ferroelectric GaN MOS-HEMT using dual gate technology." Micro & Nano Letters 14.6 (2019): 618-622. (SCI )

Admissions Apply Now