Publication

Abstract : A physical vapor deposition based molybdenum trioxide (MoO3) thin film is demonstrated as an efficient reverse-electron recombination barrier layer (RBL) at the fluorine doped tin oxide (FTO)/titanium dioxide (TiO2) interface in dye sensitized solar cells (DSSCs). Thin films of MoO3 show an average optical transmittance of ∼77% in a spectral range of 350–800 nm with bandgap value of ∼3.1 eV. For an optimum thickness of MoO3, deposited for 5 minutes, the resulting DSSCs showed 15% enhancement in efficiency (η) compared to the reference DSSC which did not use MoO3 RBL; this suggests that MoO3 is effectively suppressing interfacial recombination at the FTO/TiO2 interface. Further, increasing the thickness of MoO3 RBL at the FTO/TiO2 interface (20 minutes deposition) is observed to impede charge transport, as noticed with 55% reduction in η compared to the reference DSSC. Thin film MoO3 RBL with an optimum thickness value at the FTO/TiO2 interface efficiently blocks the leaky transport pathways in the mesoporous TiO2 nanoparticle layer and facilitates efficient charge transport as confirmed by electrochemical impedance spectroscopy.