Back close

Speckle Interferometric Investigation of Argon Pressure-Induced Surface Roughness Modifications in RF-Sputtered MoO3 Film

Publication Type : Journal Article

Publisher : Springer

Source : Journal of Nondestructive Evaluation, 40 (1), 1-9, 2021. DOI:

Url :

Campus : Amaravati

School : School of Physical Sciences

Department : Physics

Verified : No

Year : 2021

Abstract : Film quality analysis is of more considerable significance due to its diversified applications in various fields of technology. The present work reports the speckle interferometric analysis of the argon pressure-induced surface roughness modifications of RF sputtered MoO3 films. The paper suggests a new method of surface quality analysis of thin films through a parameter δ, which is the difference between the initial and final inertia moment values in the study of the thermal-induced dynamic speckle pattern. The limitations of root mean square surface roughness analysis of the atomic force microscopic image of the films is also exemplified. The research suggests that argon pressure plays a vital role in the surface property of RF sputtered films and also that the dynamic speckle analysis can give precise information about the quality of films. The contour plot of particle displacement vector under thermal stress, suggests the degree of uniformity in the distribution of particles in the film.

Cite this Research Publication : S. Soumya, R. Arun Kumar, S. Sreejyothi, Vimal Raj, M. S. Swapna and S. Sankararaman, "Speckle Interferometric Investigation of Argon Pressure Induced Surface Roughness Modifcations in RF Sputtered MoO3 Film," Journal of Nondestructive Evaluation, 40 (1), 1-9, 2021. DOI:

Admissions Apply Now