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Modeling and simulation of enhancement mode p-GaN Gate AlGaN/GaN HEMT for RF circuit switch applications

Publication Type : Journal Article

Publisher : IOPScience

Source : Journal of Semiconductors

Url : https://iopscience.iop.org/article/10.1088/1674-4926/38/6/064002/meta

Campus : Amaravati

School : School of Engineering

Year : 2017

Abstract : An enhancement mode p-GaN gate AlGaN/GaN HEMT is proposed and a physics based virtual source charge model with Landauer approach for electron transport has been developed using Verilog-A and simulated using Cadence Spectre, in order to predict device characteristics such as threshold voltage, drain current and gate capacitance. The drain current model incorporates important physical effects such as velocity saturation, short channel effects like DIBL (drain induced barrier lowering), channel length modulation (CLM), and mobility degradation due to self-heating. The predicted Id–Vds, Id-Vgs, and C-V characteristics show an excellent agreement with the experimental data for both drain current and capacitance which validate the model. The developed model was then utilized to design and simulate a single-pole single-throw (SPST) RF switch.

Cite this Research Publication : Panda, D. K., and T. R. Lenka. "Modeling and simulation of enhancement mode p-GaN Gate AlGaN/GaN HEMT for RF circuit switch applications." Journal of Semiconductors 38.6 (2017): 064002. (ESCI, Scopus )

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