Back close
Admissions

Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching

Start Date: Saturday, Oct 01,2016

End Date: Saturday, Dec 31,2016

School: School of Engineering

Funded by:Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP)
Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching

The Project entitled “Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching” is funded by Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP).

Duration: 2016

Host Institute: CeNSE, Indian Institute of Science Bangalore, India

Status: Completed

Related Projects

Integrative Health and Wellbeing – Strengthening Tribal Health with Preventative Care and Awareness
Integrative Health and Wellbeing – Strengthening Tribal Health with Preventative Care and Awareness
Machine Learning based Hand Orthotic Device
Machine Learning based Hand Orthotic Device
Experimental and Numerical Investigations on the Dynamics of Friction Oscillator Representative of Disc and Drum Brakes
Experimental and Numerical Investigations on the Dynamics of Friction Oscillator Representative of Disc and Drum Brakes
Mu-share: Multi-user Realtime Shared Access platform for Remote Experimentation
Mu-share: Multi-user Realtime Shared Access platform for Remote Experimentation
Development of a Real-time, Process Control Method Based on Neural Network Model Using Feedback of Weld Pool Geometric Parameters Measured by a Vision-based Technique and Experimental Verification for Automated Arc Welding Processes
Development of a Real-time, Process Control Method Based on Neural Network Model Using Feedback of Weld Pool Geometric Parameters Measured by a Vision-based Technique and Experimental Verification for Automated Arc Welding Processes
Admissions Apply Now