Publication

Abstract : In semiconductor manufacturing, one of the most important processes is wafer fabrication and wafer cleaning. Even if a wafer appears free of scratches to the naked eye, there are often various impurities such as dust and particles when viewed under a microscope. Considering the fact that recent semiconductor integrated circuit (IC) chips utilize nanoprocessing, even slight amounts of dust or impurities can greatly impair the performance of the manufactured semiconductor. Therefore, cleaning the wafer is extremely important. In this chapter, we would like to talk about the representative types of wafers that exist in the semiconductor industry and their characteristics. Next, the specific process and solution used for wafer cleaning will be covered step by step.