Publication Type : Journal Article
Publisher : Springer Nature Singapore
Url : https://doi.org/10.1007/978-981-99-6649-3_49
Campus : Kochi
School : Center for Nanosciences
Department : Nanosciences and Molecular Medicine
Year : 2024
Abstract : This chapter explores the advancements in Back End of Line (BEOL) technology in semiconductor manufacturing. BEOL encompasses the crucial steps in semiconductor fabrication after the Front End of Line (FEOL) processes, focusing on interconnects, packaging, and device integration. The article highlights the importance of BEOL in enhancing manufacturing efficiency, improving device performance, and addressing the challenges of advanced semiconductor technologies. It discusses various aspects of BEOL, including interconnect materials, advanced packaging techniques, and reliability considerations. By understanding the advancements in BEOL, semiconductor manufacturers can optimize their manufacturing processes and deliver high-performance, reliable devices.
Cite this Research Publication : Laxman Raju Thoutam, Young Suh Song, Advancements in Back End of Line Technology: Enhancing Semiconductor Manufacturing Efficiency, Springer Nature Singapore, 2024, https://doi.org/10.1007/978-981-99-6649-3_49