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EOT scaling and device issues for high-k gate dielectrics

Publication Type : Conference Paper

Publisher : Gate Insulator, 2003. IWGI 2003. Extended Abstracts of International Workshop

Source : Gate Insulator, 2003. IWGI 2003. Extended Abstracts of International Workshop on, 2003.

Campus : Amritapuri

School : School of Engineering

Department : Electronics and Communication

Year : 2003

Abstract :

Cite this Research Publication :
M. I. Gardner, Dr. Sundararaman Gopalan, Gutt, J., Peterson, J., Li, H. - J., and Huff, H. R., “EOT scaling and device issues for high-k gate dielectrics”, in Gate Insulator, 2003. IWGI 2003. Extended Abstracts of International Workshop on, 2003.

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