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High Performance ALD Reactor for High-k Films Films – Progress in ALD Equipment and Processing

Publication Type : Journal Article

Publisher : ECS Transactions, The Electrochemical Society

Source : ECS Transactions, The Electrochemical Society, Volume 3, Number 15, p.27–36 (2007)

Campus : Coimbatore

School : School of Engineering

Department : Chemical

Year : 2007

Abstract : In this work we discuss the design requirements for achieving higher productivity ALD solutions and we present a single-wafer reactor design that incorporates improvement elements. The effectiveness of this approach is evaluated by examining the improved step coverage, saturation, uniformity and electrical properties of ZrO2 high-k films deposited using this reactor system.

Cite this Research Publication : J. Dalton, Kim, H. Young, Zhang, Z., Seidel, T., Karim, Z., and Dr. Sasangan Ramanathan, “High Performance ALD Reactor for High-k Films”, ECS Transactions, vol. 3, pp. 27–36, 2007.

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