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VLSI Transistor and Interconnect Scaling Overview

Publication Type : Journal Article

Publisher : Journal of Electronic Design Technology

Source : Journal of Electronic Design Technology, Volume 5, Issue 1, p.1–15 (2014)

Url : https://www.researchgate.net/profile/Pritam_Bhattacharjee4/publication/290883859_VLSI_Transistor_and_Interconnect_Scaling_Overview/links/5c1b2b81458515a4c7eb1aee/VLSI-Transistor-and-Interconnect-Scaling-Overview.pdf

Campus : Amritapuri

School : Department of Computer Science and Engineering, School of Engineering

Department : Computer Science

Year : 2014

Abstract : In this paper, various types of device and interconnect scaling used for VLSI transistors are mentioned. Advanced device scaling techniques using SOI & FINFET technology are discussed for nano-devices. New technologies adopted at research level are stated here in brief.

Cite this Research Publication : Dr. Pritam Bhattacharjee and Arindam Sadhu, “VLSI Transistor and Interconnect Scaling Overview”, Journal of Electronic Design Technology, vol. 5, no. 1, pp. 1–15, 2014.

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