Publication Type:

Conference Paper

Source:

Rapid Thermal and Other Short-time Processing Technologies II: Proceedings of the International Symposium, The Electrochemical Society (2001)

Cite this Research Publication

R. Nieh, Onishi, K., Choi, R., Dharmarajan, E., Dr. Sundararaman Gopalan, Kang, C. S., and Lee, J. C., “HIGH-K GATE DIELECTRICS: Hf02, ZK> 2, AND THEIR SILICATES”, in Rapid Thermal and Other Short-time Processing Technologies II: Proceedings of the International Symposium, 2001.

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