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HIGH-K GATE DIELECTRICS: Hf02, ZK> 2, AND THEIR SILICATES

Publication Type : Conference Paper

Publisher : The Electrochemical Society

Source : Rapid Thermal and Other Short-time Processing Technologies II: Proceedings of the International Symposium, The Electrochemical Society (2001)

Campus : Amritapuri

School : School of Engineering

Department : Electronics and Communication

Year : 2001

Abstract :

Cite this Research Publication : R. Nieh, Onishi, K., Choi, R., Dharmarajan, E., Dr. Sundararaman Gopalan, Kang, C. S., and Lee, J. C., “HIGH-K GATE DIELECTRICS: Hf02, ZK> 2, AND THEIR SILICATES”, in Rapid Thermal and Other Short-time Processing Technologies II: Proceedings of the International Symposium, 2001.

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