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Low temperature deposition of nanocrystalline SiC films by PECVD and their structural and optical characterization

Publication Type : Journal Article

Publisher : J. Applied Physics

Source : J. Applied Physics, Volume 94, Number 8, p.5252–5260 (2003)

Campus : Coimbatore

School : School of Engineering

Department : Electronics and Communication

Year : 2003

Abstract :

Cite this Research Publication : Dr. T. Rajagopalan, Wang, X., Lahlouh, B., Ramkumar, C., Dutta, P. S., and Gangopadhyay, S., “Low temperature deposition of nanocrystalline SiC films by PECVD and their structural and optical characterization”, J. Applied Physics, vol. 94, pp. 5252–5260, 2003.

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