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Process Optimization in Atomic Layer Deposition of High-K Oxides for Advanced gate Stack Engineering

Publication Type : Journal Article

Publisher : Society for Solid State and Electrochemical Science and Technology

Source : Conference Proceedings, the Society for Solid State and Electrochemical Science and Technology, p.163-176 (2002)

Campus : Coimbatore

School : School of Engineering

Department : Chemical

Year : 2002

Abstract :

Cite this Research Publication : A. Londergan, Dr. Sasangan Ramanathan, Rassiga,, Hinzay, R., Winkler, J., Velasco, H., Matthysse, L., Seidel, T. E., Ang, C. H., Yu, H. Y., and Li, M. F., “Process Optimization in Atomic Layer Deposition of High-k Oxides for Advanced Gate Stack Engineering”, Conference Proceedings, the Society for Solid State and Electrochemical Science and Technology. pp. 163-176, 2002.

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