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Semiconductor wafer polishing apparatus

Publication Type : Patents

Source : Volume US6462409 B1, Number US 09/876,259 (2002)

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Campus : Amritapuri

School : Centre for Cybersecurity Systems and Networks, School of Engineering

Center : Cyber Security, TBI

Department : cyber Security

Year : 2002

Abstract : pA semiconductor wafer polishing method and apparatus therefor are provided having a system housing and a robotic handling system for moving the semiconductor wafer between a belt module and a rotary module for respective linear and rotary polishing. A buff module and a cleaning module are provided in the system housing for buffing and cleaning the semiconductor wafer./p

Cite this Research Publication : Dr. Krishnashree Achuthan and Woo, C. Mei- Chu, “Semiconductor wafer polishing apparatus”, U.S. Patent US 09/876,2592002.

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