Back close
Admissions

Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching

Start Date: Saturday, Oct 01,2016

End Date: Saturday, Dec 31,2016

School: School of Engineering

Funded by:Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP)
Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching

The Project entitled “Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching” is funded by Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP).

Duration: 2016

Host Institute: CeNSE, Indian Institute of Science Bangalore, India

Status: Completed

Related Projects

Netravaad
Netravaad
Design and Development of an IoT Based Smart Irrigation and Fertilization System for Chilli Farming
Design and Development of an IoT Based Smart Irrigation and Fertilization System for Chilli Farming
Automated Traffic Sign Recognition System For Indian Roads
Automated Traffic Sign Recognition System For Indian Roads
Edge Preserving Image Fusion Using RMS Contrast and Linear Prediction Model
Edge Preserving Image Fusion Using RMS Contrast and Linear Prediction Model
Developing a Sustainable Education System for Rural Chhattisgarh
Developing a Sustainable Education System for Rural Chhattisgarh
Admissions Apply Now