Back close
Admissions

Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching

Start Date: Saturday, Oct 01,2016

End Date: Saturday, Dec 31,2016

School: School of Engineering

Funded by:Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP)
Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching

The Project entitled “Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching” is funded by Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP).

Duration: 2016

Host Institute: CeNSE, Indian Institute of Science Bangalore, India

Status: Completed

Related Projects

Nutrition – Awareness Program on Micronutrient Deficiencies
Nutrition – Awareness Program on Micronutrient Deficiencies
Edge Preserving Image Fusion Using RMS Contrast and Linear Prediction Model
Edge Preserving Image Fusion Using RMS Contrast and Linear Prediction Model
New and Efficient Photosensitizers for Nanocrystalline TiO2 Based Dye Sensitized Solar Cells
New and Efficient Photosensitizers for Nanocrystalline TiO2 Based Dye Sensitized Solar Cells
Energy Management on Smart Grid using Embedded Systems
Energy Management on Smart Grid using Embedded Systems
Automation of Transport and Building Feature Extraction using Deep Learning with Super-Resolution Enhancement of Satellite Imagery
Automation of Transport and Building Feature Extraction using Deep Learning with Super-Resolution Enhancement of Satellite Imagery
Admissions Apply Now