Programs
- M. Tech. in Automotive Engineering -Postgraduate
- B. Tech. in Computer Science and Engineering (Quantum Computing) 4 Years -Undergraduate
The Project entitled “Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching” is funded by Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP).
Duration: 2016
Host Institute: CeNSE, Indian Institute of Science Bangalore, India
Status: Completed
