Back close
Admissions

Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching

Start Date: Saturday, Oct 01,2016

End Date: Saturday, Dec 31,2016

School: School of Engineering

Funded by:Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP)
Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching

The Project entitled “Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching” is funded by Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP).

Duration: 2016

Host Institute: CeNSE, Indian Institute of Science Bangalore, India

Status: Completed

Related Projects

A modular cyber physical system for sustainable water management(selected)
A modular cyber physical system for sustainable water management(selected)
ClePa – A robot for cleaning staircase steps
ClePa – A robot for cleaning staircase steps
Dosa Making Robot
Dosa Making Robot
Security Event Processing Acceleration using GPGPU
Security Event Processing Acceleration using GPGPU
A Case Study on Medical Camps During 2018 Kerala Floods
A Case Study on Medical Camps During 2018 Kerala Floods
Admissions Apply Now