Back close
Admissions

Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching

Start Date: Saturday, Oct 01,2016

End Date: Saturday, Dec 31,2016

School: School of Engineering

Funded by:Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP)
Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching

The Project entitled “Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching” is funded by Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP).

Duration: 2016

Host Institute: CeNSE, Indian Institute of Science Bangalore, India

Status: Completed

Related Projects

Mudra-Hand Gesture Based Wheelchair Navigation
Mudra-Hand Gesture Based Wheelchair Navigation
Nutrition – Awareness Program on Micronutrient Deficiencies
Nutrition – Awareness Program on Micronutrient Deficiencies
BODHI: Public Surveillance & Awareness Tele-Operated Robot
BODHI: Public Surveillance & Awareness Tele-Operated Robot
Driving Assistance System Based Ongaze Tracking and Road Scene Events Detection
Driving Assistance System Based Ongaze Tracking and Road Scene Events Detection
Detection and Prevention of Advanced Persistent Threat (APT) Activitiesin Heterogeneous Networks using SIEM and Deep Learning
Detection and Prevention of Advanced Persistent Threat (APT) Activitiesin Heterogeneous Networks using SIEM and Deep Learning
Admissions Apply Now