Back close

Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching

Start Date: Saturday, Oct 01,2016

End Date: Saturday, Dec 31,2016

School: School of Engineering

Funded by:Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP)
Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching

The Project entitled “Fabrication of Silica Etch Mask using EBL and F Chemistry Dry Etching” is funded by Ministry of Electronics & Information Technology (MeitY) through Indian Nanoelectronics Users Program (INUP).

Duration: 2016

Host Institute: CeNSE, Indian Institute of Science Bangalore, India

Status: Completed

Related Projects

Machine Learning based Hand Orthotic Device
Machine Learning based Hand Orthotic Device
E-Literacy
E-Literacy
Object Detection From Cluttered Image
Object Detection From Cluttered Image
Autonomous Navigational Platform for Elderly and Physically Challenged
Autonomous Navigational Platform for Elderly and Physically Challenged
Smart Handheld Device for Detection of Gas Poisoning in Sewage Works
Smart Handheld Device for Detection of Gas Poisoning in Sewage Works
Admissions Apply Now