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A High Deposition Rate Process Using Limited Optimized Reaction ALD”, Atomic Layer Deposition Conference

Publication Type : Conference Proceedings

Publisher : Atomic Layer Deposition Conference, American Vacuum Society

Source : Atomic Layer Deposition Conference, American Vacuum Society, p.1308-1311 (2004)

Campus : Coimbatore

School : School of Engineering

Department : Chemical

Year : 2004

Abstract :

Cite this Research Publication : Kim G. Y., Srivastava A., Foote D., Londergan A., Karim Z., Seidel T. E., and Dr. Sasangan Ramanathan, “A High Deposition Rate Process Using Limited Optimized Reaction ALD”, Atomic Layer Deposition Conference”, Atomic Layer Deposition Conference, American Vacuum Society. pp. 1308-1311, 2004.

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