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Statistics

50+

50+

Patents
20192

20192

Books
12000

12000

Book
Chapters
4219

4219

Journal
Publications /
Scopus Indexed
216

216

Conference
Proceedings
9281

9281

Other
Publications
Publications
Management of Female Infertility by Phalaghrita

Authors : Dr. Rabinarayan Tripathy

Publisher :Ancient Science of Life

Publications
Low-k organosilicate films prepared by tetravinyltetramethylcyclotetrasiloxane

Authors : Dr. T. Rajagopalan, Lubguban, J.; Mehta, N.; Lahlouh, B.; Simon, S. L.; Gangopadhyay, S.

Publisher :Journal of Applied Physics

Publications
Left Main Stenting : Special Reference to Atherosclerotic and Non Atherosclerotic Indications

Authors : Dr. Praveen G. Pai, kumar, V., B. V. Pai, P. Kamath, Mahesh, N. K., and K. K. Haridas

Publisher :IHJ

Publications
Land transaction in tribal economies: a study from the scheduled areas of orissa

Authors : Dr. Amalendu Jothishi, Deshpande, R.S

Publisher :Institute for Social and Economic Change

Publications
k-out-of-n-system with repair: The N-policy

Authors : Dr. Usha Kumari P. V., Lakshmy, B, Krishnamoorthy, A

Publisher :NATIONAL UNIVERSITY OF SINGAPORE

Publications
Interaction between Physisorbed Polymer Layers: Anisotropic Mean-Field Theory

Authors : Dr. Murali Rangarajan, Jimenez J; Rajagopalan R

Publisher :Chemistry at Interfaces, Gordon Research Conferences (GRC)

Publications
Impact of NH/sub 3/ pre-treatment on the electrical and reliability characteristics of ultra thin hafnium silicate films prepared by re-oxidation method

Authors : Dr. Sundararaman Gopalan, Choi, R., Onishi, K., Nieh, R., Kang, C. S., Cho, H. J., Krishnan, S., and Lee, J. C.

Publisher :60th DRC. Conference Digest Device Research Conference

Publications
Impact of NH3 pre-treatment on the electrical and reliability characteristics of ultra thin hafnium silicate films prepared by re-oxidation method

Authors : Gopalan, S Choi; Onishi, R; Nieh, K; Kang, R; Cho, CS; Krishnan, H-J; S Lee, JC

Publisher :60th DRC. Conference Digest

Publications
High quality MOSFETs fabrication with HfO/sub 2/ gate dielectric and tan gate electrode

Authors : Dr. Sundararaman Gopalan, R. Choi, Onishi, K., Kang, C. Scok, Nieh, R., Cho, H. - J., Krishnan, S., and Lee, J. C.

Publisher :60th DRC. Conference Digest Device Research Conference, IEEE

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