Publisher : Optik
Campus : Coimbatore
School : School of Engineering
Department : Sciences
Year : 2015
Abstract : Alpha alumina thin film has been deposited on glass substrate by simple chemical bath deposition technique at 60. °C. The structure and the crystallinity of the alpha alumina thin film were determined by X-ray diffraction and the grain size calculated from X-ray diffraction was 85. nm. The optical band gap of the film measured from UV-visible spectroscopy was 4.5. eV. The surface morphology of the film was traced by scanning electron microscopy and photoluminescence spectrum of the film shows that the presence of oxygen vacancies. © 2015 Elsevier GmbH.