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ALD of advanced high-k and metal gate stacks for MOS devices

Publication Type : Conference Paper

Publisher : Proceedings-Electrochemical Society, Electrochemical Society

Source : Proceedings-Electrochemical Society, Electrochemical Society, Volume PV 2005-05, p.282-292 (2005)

Campus : Amritapuri

School : School of Engineering

Department : Electronics and Communication

Year : 2005

Abstract :

Cite this Research Publication : J. Gutt, Dr. Sundararaman Gopalan, Brown, G. A., Kirsch, P. D., Peterson, J. J., Gardner, M. I., Li, H. - J., Lysaght, P., Alshareef, H. N., Choi, K., and , “ALD of advanced high-k and metal gate stacks for MOS devices”, in Proceedings-Electrochemical Society, 2005, vol. PV 2005-05, pp. 282-292.

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